Arbetsbeskrivning

Are you an experienced and hands-on ALD Research Engineer?

Smoltek Semi AB is pioneering ultra-thin carbon nanofiber-based metal-insulator-metal (CNF-MIM) capacitor technology. To accelerate our technology development, we are looking for an experienced and hands-on ALD Research Engineer who can develop, characterize, and optimize dielectric stacks as well as metal electrode layers for integration on CNF-based structures. The work will primarily be performed using Smoltek’s in-house ALD tool.

This is a lab-centric role where you will work close to process, materials, and device colleagues to push performance, yield, and manufacturability.

You will directly report to the CTO.

What you will do:

• Develop ALD dielectric stacks (e.g. Al₂O₃, HfO₂, ZrO₂, laminates) tailored for high-capacitance CNF-MIM devices, with focus on conformality over 3D/CNF structures, low leakage, and reliability.
• Engineer ALD/CVD/PVD-compatible metal electrodes (e.g. TiN, Ru, W) suitable for CNF-based MIM integration.
• Plan and execute experimental series/DOEs – define objectives, timeline, and deliverables, and follow up with clear reporting to stakeholders.
• Coordinate with adjacent teams (CNF growth, device, reliability) to align process requirements, time plans, and tool availability.
• Characterize films and stacks using ellipsometry, XRD (with partners), SEM, TEM (with partners), AFM, and electrical tests (C‑V, I‑V, breakdown).
• Document and transfer processes into well-described run sheets and contribute to design rules for the CNF-MIM technology platform.
• Work with external labs/foundries when needed for advanced characterization or pilot production.
• Contribute to IP generation through novelty in materials stacks and integration schemes.

What you bring:

• M.Sc. or Ph.D. in Materials Science, Solid State Physics, Electrical Engineering, Chemical Engineering, or similar.
• Hands-on experience with ALD (thermal and/or PEALD) for high‑k dielectrics or barrier/seed/electrode layers.
• Good understanding of film growth on 3D or high-aspect-ratio structures and the challenges of conformality, nucleation, and surface preparation.
• Experience with at least some of the following:
• High‑k dielectrics for MIM/MOS devices
• Conductive nitrides (TiN, TaN) or Ru/W electrodes
• Leakage, breakdown and reliability testing of dielectric stacks
• Plasma surface treatments and adhesion promotion
• Basic project management skills – ability to define tasks, prioritize experiments, keep simple time plans, and communicate progress/risks.
• A structured way of working, with attention to detail and reproducibility.

Nice to have:

• Knowledge of carbon nanomaterials (CNT/CNF/graphene).
• Familiarity with semiconductor process flows.
• Experience working with external suppliers, foundries, or equipment vendors.
• Patent or publication track record in thin films or MIM devices.

Why Smoltek?

Smoltek is working on a technology you won’t find just anywhere; we combine carbon nanofibers with advanced thin films to enable next-generation capacitors. Here you get to work close to the actual devices, see the impact of your experiments quickly, and drive the process flow rather than just following it. The team is small, skilled, and collaborative, so good ideas move fast. And you get to do all of this in a balanced work–life environment.

How to apply:

Send your application to [email protected] latest December 30th, 2025